Type |
Characteristic function |
Composition |
Note |
ZQ |
Forming rigid thin film |
SiO2-ZrO2 oligomer |
ROHS Compliant |
GPM |
Forming rigid thin film
Control of refractive index
UV irradiation is not essential |
SiO2-ZrO2-TiO2 oligomer |
PAM |
Forming rigid thin film
Control of refractive index
High adhesion to PI |
SiO2-ZrO2-TiO2 oligomer and silica filler |
ASM |
Forming rigid thin film
Control of refractive index
High adhesion to PI |
SiO2-ZrO2-TiO2 oligomer and electro conductive filler |
TA |
Forming rigid thin film at 250°C |
SiO2-ZrO2-TiO2 oligomer |
HRS |
Lowering baking temperature at 220°C
Forming rigid thin film
Erastic property |
|
SSS-423 |
|
|